首页> 外国专利> Production of layer system used for optical precision components comprises depositing individual layers on substrate in vacuum deposition chamber using pulsed magnetron sputtering stations at prescribed speed

Production of layer system used for optical precision components comprises depositing individual layers on substrate in vacuum deposition chamber using pulsed magnetron sputtering stations at prescribed speed

机译:用于光学精密部件的层系统的生产包括使用脉冲磁控溅射站以规定的速度在真空沉积室中的基板上沉积单个层

摘要

The invention relates to a method and device for producing layer systems for optical precision components that, on a substrate, contain a stack of optically active layers which are alternately high-refractive and low-refractive. The precipitation of individual layers is effected by pulsed magnetron sputter stations that are reactively operated in the transient mode at a constantly maintained operating point. The substrate is passed with uniform linear motion in front of the respective pulsed magnetron sputter station with the associated target material, from which the layer is reactively formed, at a predetermined velocity v1, whereby v1 is set during the precipitation of individual layers so that after a predetermined number of passes, the respective layer is applied with a thickness of at least 50 % of the specified layer thickness. An optical precision measurement of the transmission and/or of the reflection and/or of the polarization of the partial layer system is subsequently effected on the substrate. The result of this measurement is compared with a specified value that has to be achieved after the completed precipitation of the respective layer.
机译:本发明涉及一种用于制造光学精密部件的层系统的方法和装置,该光学系统在基板上包含光学活性层的堆叠,该光学活性层交替地是高折射的和低折射的。各个层的沉淀是由脉冲磁控溅射站实现的,该脉冲磁控溅射站在持续保持的工作点以瞬态模式进行反应性操作。使基材以预定的速度v1在相应的脉冲磁控溅射站的前面以均匀的线性运动通过相关的目标材料,从该目标材料反应形成该层,从而在沉积各个层期间设置v1,以便在预定次数的通过之后,各层的厚度至少为指定层厚度的50%。随后在衬底上进行部分层系统的透射和/或反射和/或偏振的光学精度测量。将测量结果与在各层完全沉淀后必须达到的指定值进行比较。

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