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Production of layer system used for optical precision components comprises depositing individual layers on substrate in vacuum deposition chamber using pulsed magnetron sputtering stations at prescribed speed
Production of layer system used for optical precision components comprises depositing individual layers on substrate in vacuum deposition chamber using pulsed magnetron sputtering stations at prescribed speed
The invention relates to a method and device for producing layer systems for optical precision components that, on a substrate, contain a stack of optically active layers which are alternately high-refractive and low-refractive. The precipitation of individual layers is effected by pulsed magnetron sputter stations that are reactively operated in the transient mode at a constantly maintained operating point. The substrate is passed with uniform linear motion in front of the respective pulsed magnetron sputter station with the associated target material, from which the layer is reactively formed, at a predetermined velocity v1, whereby v1 is set during the precipitation of individual layers so that after a predetermined number of passes, the respective layer is applied with a thickness of at least 50 % of the specified layer thickness. An optical precision measurement of the transmission and/or of the reflection and/or of the polarization of the partial layer system is subsequently effected on the substrate. The result of this measurement is compared with a specified value that has to be achieved after the completed precipitation of the respective layer.
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