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Low dielectric constant films derived by sol-gel processing of a hyperbranched polycarbosilane
Low dielectric constant films derived by sol-gel processing of a hyperbranched polycarbosilane
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机译:通过超支化聚碳硅烷的溶胶-凝胶工艺获得的低介电常数薄膜
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摘要
A hybrid organic/inorganic organosilicon networked polymer material having a compositional formula [Si(O)CH2]n and a dielectric constant of less than 2.4 is provided. The material may be used as an interlayer dielectric film in a semiconductor device. The film is preferably fabricated by a sol-gel process using an alkoxy substituted hyperbranched polycarbosilane precursor material.
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