METHOD FOR PRODUCING ARTICLE HAVING BEEN SUBJECTED TO LOW REFLECTION TREATMENT, SOLUTION FOR FORMING LOW REFLECTION LAYER AND ARTICLE HAVING BEEN SUBJECTED TO LOW REFLECTION TREATMENT

摘要

A method for producing an article having been subjected to a low reflection treatment, which comprises coating the surface of a resin substrate with a solution for forming a low reflection layer prepared by mixing (1) fine silica particles consisting of at least one of non-agglomerated silica particles having an average particle diameter of 40 to 1000 nm, hollow non-agglomerated silica particles having an average particle diameter of 10 to 100 nm and agglomerated fine silica particles in a chain form having an average primary particle diameter of 10 to 100 nm, and (2) a binder fluid containing a hydrolyzable silicon compound, water, a catalyst for hydrolyzing the silicon compound and a solvent, to effect reactions including the hydrolysis of the silicon compound and then adding (3) a curing catalyst for accelerating the condensation of silanol groups, and effecting a curing reaction of the above solution at room temperature or a temperature of room temperature to a temperature “a which the substrate is not damaged”(a heat distortion temperature or lower in the case of a thermoplastic resin and a decomposition temperature or lower in the case of a thermosetting resin), to thereby form a low reflection layer containing the fine silica particles and the binder in a solids weight ratio of 30 : 70 to 95 : 5.