METHOD FOR PRODUCING ARTICLE HAVING BEEN SUBJECTED TO LOW REFLECTION TREATMENT, SOLUTION FOR FORMING LOW REFLECTION LAYER AND ARTICLE HAVING BEEN SUBJECTED TO LOW REFLECTION TREATMENT

摘要

A low reflection treated article manufacturing method wherein a low reflection layer solution, obtained by mixing and reacting (1) silica microparticles, comprising at least one type of silica microparticles selected from the group consisting of non-aggregated silica microparticles with an average particle diameter of 40 to 1000nm, hollow non-aggregated silica microparticles with an average particle diameter of 10 to 100nm, and chain-like aggregated silica microparticles with an average primary particle diameter of 10 to 100nm, (2) a hydrolyzable silicon compound, water, and a binder solution, containing a solvent and a hydrolysis catalyst for the above-mentioned silicon compound, to hydrolyze the above-mentioned silicon compound and (3) adding a curing catalyst, which promotes the condensation of silanol groups, is coated onto a resin base material and reacted and cured at room temperature or within a range of room temperature to "a temperature at which the base material will not be damaged" (the deformation temperature or less in the case of a thermoplastic resin or the decomposition temperature or less in the case of a hardening resin) to form a low reflection layer, containing silica microparticles and a binder at a solids weight ratio of 30:70 to 95:5.