LITHOGRAPHY PROJECTION DEVICE TO IMPROVE THROUGHPUT OF MULTIPLE-STAGED LITHOGRAPHY DEVICE BY REDUCING TIME REQUIRED FOR EACH STEP IN CRITICAL PATH, PREPARATION METHOD OF DEVICE AND COMPUTER PROGRAM

摘要

PURPOSE: A lithography projection device, a preparation method of a device and a computer program used in the computer system controlling the lithography projection system are provided, to improve the throughput of a multiple-staged lithography device by employing a planar motor as a transport means. CONSTITUTION: The lithography projection device comprises at least one substrate table which holds a substrate; a first station where a substrate is measured; a second station where a substrate is exposed; a displacement measuring system which measures the displacement between the substrate table of the first and second stations; a transport means which transports the substrate between the first and second stations; a radiation system which supplies a projected beam of radiation and is related with the second station; a support structure which supports a patterning means patterning the projected beam according to a certain pattern; and a projection system which projects the beam patterned on the target area of a substrate, wherein the displacement measuring system measures the displacement of the substrate continuously from at least two directions during the transport between the first and second stations, and the transport means is a planar motor.