DEVICE MANUFACTURING METHOD FOR REDUCING EXPOSURE TIME FOR DUMMY STRUCTURE, DEVICE MANUFACTURED THEREBY, COMPUTER PROGRAM AND LITHOGRAPHY APPARATUS

摘要

PURPOSE: A device manufacturing method, a device manufactured thereby, a computer program and a lithography apparatus are provided to reduce an exposure period at an edge of a wafer by using a predetermined one-step exposure for a dummy pattern instead of a two-step exposure. CONSTITUTION: A substrate(W) is provided. A projection beam of radiation is provided by using an illumination system. A cross-section of the projection beam in an object plane is formed by a beam masking device. A patterning part endows the cross-section of the projection beam with a pattern in the object plane. The substrate is scanned to a scanning direction and the patterned beam is projected on targets(C) of the substrate. An edge in the cross-section of the projection beam is changed to modify the width of the cross-section to a vertical direction(X) of a scanning direction(Y).