INORGANIC THIN FILM, ORGANIC ELECTRONIC DEVICE INCLUDING INORGANIC THIN FILM AND FABRICATION METHOD

摘要

PURPOSE: An inorganic thin film is provided to prevent a permeation of a moisture and an oxygen and fabricate the inorganic thin film from an inorganic composite having an inorganic materials more than two with a prescribed ratio. CONSTITUTION: An inorganic thin film(7a) comprises an inorganic composite mixed more than two inorganic materials selected from a group constituted by a metal, a nonmetallic oxide, a nitride, and a salt, and have a permeation prevention characteristics of an improved moisture and an oxygen. The metal and the nonmetallic oxide have a silicon oxide(SiO2), a magnesium oxide(MgO), a calcium oxide(CaO), an aluminum oxide(Al2O3), a titanium oxide(TiO2), a zirconium oxide(ZrO2), a tantalum oxide(Ta2O3), and a sodium oxide(NayOx). The nitride has a silicon nitride(Si3N4), and a magnesium fluoride(MgF2).