PLASMA PROCESSING APPARATUS, RING MEMBER AND PLASMA PROCESSING METHOD TO ADJUST PLASMA STATE IN EVERY PROCESS AND COMMONLY USE APPARATUS WITH RESPECT TO PLURAL DIFFERENT PROCESS TREATMENTS

摘要

PURPOSE: A plasma processing apparatus is provided to adjust a plasma state in every process and commonly use an apparatus with respect to a plurality of different process treatments by applying a predetermined DC voltage to an electrode in a ring member composed of an insulator. CONSTITUTION: The ring member is composed of an insulating material installed to surround a substrate to be processed on a mounting table. The electrode(51) is installed in the ring member. A DC power source applies a DC voltage to the electrode to adjust a plasma sheath region above the ring member.