ANTIREFLECTIVE MATERIAL, SUBSTRATE HAVING ANTIREFLECTIVE LAYER OBTAINED FROM THE ANTIREFLECTIVE MATERIAL, AND PATTERN FORMATION METHOD USING THE ANTIREFLECTIVE MATERIAL TO IMPROVE ETCHING SELECTIVITY AND TO OBTAIN VERTICAL RESIST PATTERN

摘要

PURPOSE: An antireflective material, a substrate having an antireflective layer obtained from the antireflective material and a pattern formation method using the antireflective material are provided, to obtain an excellent antireflective effect to the exposure using the light having a short wavelength and a high etching selectivity and to allow a vertical resist pattern to be formed on a photoresist layer on the antireflective layer. CONSTITUTION: The antireflective material comprises a polymer compound having a repeating unit represented by the formula 1, wherein R1 is a monovalent organic group having a crosslinking group; R2 is a monovalent organic group having a light absorbing group; R3 is a monovalent group having at least one functional group selected from carbonyl, ester, a lactone, amide, ether and nitrile; 0a11, 0b11, 0c11, and 0.5=a1+b1+c1=1; R4, R5 and R6 are H, OH, a C1-C6 alkyl group, a C6-C10 aryl group or a C1-C6 fluorinated alkyl group; and m, n and p are 0 or 1. Also the antireflective material comprises a polymer compound having a repeating unit represented by the formula 2 and a polymer compound having a repeating unit represented by the formula 3, wherein 0a21, 0b21, and 0.5= a2+b2=1, and 0a31, 0c21, and 0.5=a3+c2=1.