METHOD FOR FORMING THIN FILM PATTERN, METHOD FOR FABRICATING DEVICE, ELECTRICAL OPTICAL APPARATUS AND ELECTRONIC INSTRUMENT TO CONTROL DEFECT LIKE SHORT CIRCUIT

摘要

PURPOSE: A method for forming a thin film pattern is provided to control a defect like a short circuit by disposing functional liquid on a substrate. CONSTITUTION: A bank is formed on a substrate according to a thin film pattern(S1). The residue between the banks is eliminated(S2-1). Functional liquid is disposed between the banks from which the residue is removed. The residue removing process is to eliminate the residue in the bottom part between the banks. The residue removing process includes a plasma treatment process using predetermined process gas and/or a light irradiation treatment process.