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METHOD FOR FORMING PATTERN, METHOD FOR FORMING INTERCONNECTION PATTERN, ELECTRICAL OPTICAL DEVICE AND ELECTRONIC INSTRUMENT TO EVAPORATE OR ANALYZE THIN FILM OF DESIRED REGION AND PATTERN THIN FILM
METHOD FOR FORMING PATTERN, METHOD FOR FORMING INTERCONNECTION PATTERN, ELECTRICAL OPTICAL DEVICE AND ELECTRONIC INSTRUMENT TO EVAPORATE OR ANALYZE THIN FILM OF DESIRED REGION AND PATTERN THIN FILM
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机译:形成图案的方法,形成互连图案的方法,光学器件和电子仪器以蒸发或分析所需区域和图案薄膜的薄膜
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摘要
PURPOSE: A method for forming a pattern is provided to evaporate or analyze a thin film of a desired region and pattern a thin film by installing a sublimation material on or in a base member. CONSTITUTION: A thin film(2) is formed on a base member(1) including a sublimation material. Light is irradiated to the base member. The sublimation material in a desired region is sublimed by the heat generated by the irradiation of the light. The thin film corresponding to the irradiation region is eliminated to pattern the thin film.
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