PHOTORESIST STRIPPING SOLUTION COMPOSITION COMPRISING N-METHYLETHANOLAMINE AND CORROSION INHIBITOR

摘要

PURPOSE: A photoresist stripping solution composition is provided, to improve a stripping property, to prevent the corrosion on metal wire and to allow the rinsing process using an alcohol-based organic solvent in dual layer wiring process to be omitted for reducing the process time and the cost. CONSTITUTION: The photoresist stripping solution composition comprises 1-80 wt% of N-methylethanolamine and 0.1-10 wt% of a corrosion inhibitor. Preferably the corrosion inhibitor is at least one selected from the group consisting of an alkyl gallate of C1-C12 and mercaptomethyl benzimidazole. Preferably the composition comprises further at least one corrosion inhibitor selected from the group consisting of a triazole and an organic acid; at least one aliphatic organic amine selected from the group consisting of a primary aliphatic amine, a secondary aliphatic amine other than N-methylethanolamine, and a tertiary aliphatic amine; an aprotic polar solvent; and/or a protic polar solvent.