Positive and Negative Nano-patterning Methods on Resist Films by Changing the Polarity of a Tip Bias Voltage in AFM Lithography

摘要

PURPOSE: A positive and negative nano-patterning methods on resist films by changing the polarity of voltage are provided to form arbitrary embossed and positive and negative nano-patterns on an organic thin film by changing only one condition of a series of processes. CONSTITUTION: A probe and the polarity of a voltage applied across a thin film and a substrate are changed in a series of processes to embody the arbitrary embossed and positive and negative nano-patterns. Resist used in the abovementioned process is organic, inorganic or mixed resist thereof, including resist fabricated through a self-assembly method, a Langmuir-Blodgett method and a spin-coating method.