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PLATE SHOWER HEAD WITH GAS DISTRIBUTION PLATE AND GAS DIFFUSION METHOD USING THE SAME TO INJECT GAS MORE UNIFORMLY
PLATE SHOWER HEAD WITH GAS DISTRIBUTION PLATE AND GAS DIFFUSION METHOD USING THE SAME TO INJECT GAS MORE UNIFORMLY
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机译:带有气体分布板和气体扩散方法的板式喷淋头,使用相同的方法更均匀地注入气体
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摘要
PURPOSE: A plate shower head with a gas distribution plate is provided to inject gas more uniformly by simplifying the method for distributing a plate and by injecting gas of a diffusion type. CONSTITUTION: Gas inlets(412b,412c) for inner and outer regions are formed in a manner that the process gas induced from a process gas introducing hole(412a) flows sufficiently, formed in a plate shower head body(411). A volume with a gap g is formed through the gas inlets for the inner and outer regions so that a gas diffusion in a dual or triple region is performed through a division barrier(413). A pressurizing plenum forms a buffer space in which a diffusion is performed such that the buffer space is divided by the division barrier. A center plate(101) is not divided to uniformly inject the process gas induced to the pressurizing plenum to a wafer(W). The center plate is formed in a plate(201) whose inside is divided. A divided flat-plate type gas distribution plate has a plate gap g formed by positioning a plate(301) whose inside is divided in the outside of the plate(201) whose inside is divided.
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