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TRANSISTOR STRUCTURE FOR ESD PROTECTION CIRCUIT OF SEMICONDUCTOR DEVICE TO INDUCE UNIFORM DISTRIBUTION OF INJECTED CHARGES AND IMPROVE RELIABILITY OF SEMICONDUCTOR DEVICE
TRANSISTOR STRUCTURE FOR ESD PROTECTION CIRCUIT OF SEMICONDUCTOR DEVICE TO INDUCE UNIFORM DISTRIBUTION OF INJECTED CHARGES AND IMPROVE RELIABILITY OF SEMICONDUCTOR DEVICE
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机译:半导体器件ESD保护电路的晶体管结构,以诱导注入电荷的均匀分布并提高半导体器件的可靠性
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摘要
PURPOSE: A transistor structure for an ESD(electrostatic discharge) protection circuit of a semiconductor device is provided to induce uniform distribution of injected charges and improve reliability of the semiconductor device by making a low-resistance metal layer come in contact with the upper part of a gate polysilicon layer at regular intervals after the metal layer is deposited on a gate. CONSTITUTION: The first and second terminals are disposed on a semiconductor substrate(20). An active region is coupled to the first and second terminals, disposed in the semiconductor substrate under the first and second terminals. The upper surface of a gate in a direction of a major axis is electrically connected to a metal line through a metal layer filled in a plurality of contact holes. The gate is disposed between the active regions.
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