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Checking method for lithography mask used for IC manufacture using comparison of checked mask structure with reference structure after transfer of both structures to a semiconductor material
Checking method for lithography mask used for IC manufacture using comparison of checked mask structure with reference structure after transfer of both structures to a semiconductor material
The checking method has the structure of a reference mask and the structure of the mask being checked each transferred to a semiconductor material, with scanning of the structures via a device for examination of the semiconductor material, e.g. a microscope and comparison of the structures for indicating differences between the reference mask and the checked mask.
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