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Semiconductor wafer processing mask set mask inspection procedure overlays registered structure patterns in successive images of different masks for comparison with stored reference
Semiconductor wafer processing mask set mask inspection procedure overlays registered structure patterns in successive images of different masks for comparison with stored reference
A semiconductor wafer processing mask set mask (6, 8) inspection procedure overlays and compares registered structure patterns (16, 18) in successive images (30, 31) of different masks to give a combined image (33) and compares it with reference image (35) of the required resist pattern for defect classification. Independent claims are included for equipment using the procedure.
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