首页> 外国专利> Highly reflective mirror for an excimer laser comprises a substrate, a first highly reflective layer system formed on the inner side of the substrate, and a second highly reflective layer system formed on the outer side of the substrate

Highly reflective mirror for an excimer laser comprises a substrate, a first highly reflective layer system formed on the inner side of the substrate, and a second highly reflective layer system formed on the outer side of the substrate

机译:一种用于准分子激光器的高反射镜,包括:衬底;在衬底的内侧上形成的第一高反射层系统;以及在衬底的外侧上形成的第二高反射层系统。

摘要

Highly reflective mirror (1) comprises a substrate (2) having an inner side (2a) facing the laser-active medium of a laser and an outer side (2b) facing away from the inner side, a first highly reflective layer system (3) formed on the inner side of the substrate and reflecting a first wavelength, and a second highly reflective layer system (4) formed on the outer side of the substrate and reflecting a second wavelength. The first layer system and the substrate are formed so they are permeable for the second wavelength. Independent claims are also included for: (a) excimer laser pressure container; and (b) process for the production of an excimer laser mirror.
机译:高反射镜(1)包括基板(2),第一高反射层系统(3),所述基板(2)具有面向激光的激光活性介质的内侧(2a)和背离内侧的外侧(2b)。 )在基板的内侧上形成并反射第一波长,并且第二高反射层系统(4)形成在基板的外侧上并反射第二波长。形成第一层系统和衬底,使得它们对于第二波长是可渗透的。还包括以下方面的独立权利要求:(a)准分子激光压力容器; (b)生产准分子激光镜的方法。

著录项

  • 公开/公告号DE10248707A1

    专利类型

  • 公开/公告日2004-05-13

    原文格式PDF

  • 申请/专利权人 TUILASER AG;

    申请/专利号DE2002148707

  • 发明设计人 FROHWEIN HELMUT;

    申请日2002-10-18

  • 分类号H01S3/034;G02B5/22;H01S3/225;

  • 国家 DE

  • 入库时间 2022-08-21 22:43:51

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