Cleaning system for projection lens for formation of semiconductor and integrated circuit structures on baseplate has supply of gas fed to lens and has gas analysis equipment

摘要

The projector (41) has a lamp (14) producing light with a wavelength of 193 nanometers. The light passes through a projection lens (10) to a substrate coated with photosensitive lacquer (100). Gas may be passed through a line (30) via a control valve (50) to a housing (12) containing the lens. Gas leaves the lens housing through a line (40) with a carbon filter and passes through the control valve to an outlet (42). Gas supplied to the lens and gas leaving the lens is passed via lines (69,66) to a gas analysis module (43) with a detection chamber (68) and a mass spectrometer (60).