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phasenschiebermaske - blank, phasenschiebermaske and manufacturing process
phasenschiebermaske - blank, phasenschiebermaske and manufacturing process
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机译:相移掩模-空白,相移掩模及其制造工艺
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摘要
A phase shift mask blank comprising a transparent substrate and at least one layer of a phase shifter thereon, wherein the phase shifter is a film composed primarily of a fluorine-doped metal silicide, can be fabricated into a high-performance phase shift mask having adequate transmittance and good stability over time even when used with light sources that emit short-wavelength light. The phase shift mask can be used to fabricate semiconductor integrated circuits to a smaller minimum feature size and a higher level of integration. IMAGE
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