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blank for phasenschiebermaske, phasenschiebermaske, and manufacturing process
blank for phasenschiebermaske, phasenschiebermaske, and manufacturing process
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机译:空白的相移掩模,相移掩模和制造工艺
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摘要
A phase shift mask blank has a phase shift film of MoSiOC or MoSiONC on a transparent substrate, and optionally a chromium-based light-shielding film, a chromium-based antireflection film or a multilayer combination of both on the phase shift film. A manufacture method involving depositing the MoSi base phase shift film by a reactive sputtering technique using a sputtering gas containing carbon dioxide produces a phase shift mask blank and phase shift mask of quality, with advantages of in-plane uniformity and easy control during manufacture.
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