INDIUM OXIDE-TUNGSTEN OXIDE BASED TRANSPARENT CONDUCTIVE FILM, AND METHOD FOR MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a conductive film which hardly causes residues during etching, and a method for manufacturing the same.;SOLUTION: The method for manufacturing the transparent conductive film containing at least indium oxide and tungsten oxide by a sputtering method includes a sputtering step of performing the sputtering in the atmosphere of sputtering gas containing hydrogen or water and depositing the transparent conductive film. The transparent conductive film containing at least indium oxide and tungsten oxide manufactured by the above method is also provided. The transparent conductive film deposited in the above atmosphere hardly causes residues during the etching.;COPYRIGHT: (C)2006,JPO&NCIPI