LASER DRAWING APPARATUS, LASER DRAWING METHOD AND METHOD FOR MANUFACTURING PHOTOMASK

摘要

PPROBLEM TO BE SOLVED: To provide a laser drawing apparatus in which the productivity is not decreased even for a large exposure object having a resist film (photosensitive resin film) formed on the surface such as a large photomask, the optimum exposure light quantity is set even when the thickness of a resist film is varied in a minute area and favorable drawing is performed without being affected by changes in the film thickness even for a drawing pattern including a fine pattern. PSOLUTION: The laser drawing apparatus is equipped with: a drawing head 1 to irradiate an exposure object 101 with an exposure beam; a scanning means 5 to move the irradiation position of the exposure beam R on the exposure object 101; a film thickness measuring means 24 to measure the thickness of a resist film 102 based on the reflected beam of the exposure beam R by the exposure object 101; and a modulation means 4 to modulate the intensity of the exposure beam based on a predetermined drawing pattern and the measurement result obtained by the film thickness measuring means 24. PCOPYRIGHT: (C)2006,JPO&NCIPI