MATERIAL FOR FORMING RESIST PROTECTION FILM FOR LIQUID IMMERSION LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN BY USING THE PROTECTION FILM

摘要

PPROBLEM TO BE SOLVED: To prevent the deterioration of a resist film and the deterioration of an immersion liquid at the same time in the liquid immersion lithography using various immersion liquids including water without increasing the number of processing steps and enabling the formation of a high-resolution resist pattern in a liquid immersion lithography, especially a lithographic process to improve the resolution of a resist pattern by placing a liquid layer having a prescribed thickness and a refractive index higher than that of air and lower than that of the resist film at least on the resist film in the pathway of the lithographic exposure light to the resist film. PSOLUTION: A protection film essentially free from compatibility with a liquid for immersing a resist film, especially water and soluble in an alkali is formed on the surface of the resist film to be used in the liquid immersion lithography. PCOPYRIGHT: (C)2005,JPO&NCIPI