首页> 外国专利> METHOD OF MANUFACTURING THIN FERROELECTRIC FILM, FERROELECTRIC MEMORY DEVICE, FERROELECTRIC ELEMENT, INK-JET RECORDING HEAD, INK-JET PRINTER, SURFACE ACOUSTIC WAVE ELEMENT, FREQUENCY FILTER, OSCILLATOR, ELECTRONIC CIRCUIT, AND ELECTRONIC EQUIPMENT

METHOD OF MANUFACTURING THIN FERROELECTRIC FILM, FERROELECTRIC MEMORY DEVICE, FERROELECTRIC ELEMENT, INK-JET RECORDING HEAD, INK-JET PRINTER, SURFACE ACOUSTIC WAVE ELEMENT, FREQUENCY FILTER, OSCILLATOR, ELECTRONIC CIRCUIT, AND ELECTRONIC EQUIPMENT

机译:制造薄铁电薄膜,铁电存储器,铁电元件,喷墨记录头,喷墨打印机,表面声波元件,频率滤波器,振荡器,电子电路和电子的方法

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing thin ferroelectric film by which the occurrence of incovenience caused by the vaporization (withdrawal) of a volatile element can be eliminated at the time of manufacturing a thin ferrorelectric film containing the volatile element; and to provide a ferroelectric memory device, ferroelectric element, ink-jet recording head, ink-jet printer, surface acoustic wave element, frequency filter, oscillator, electronic circuit, and electronic equipment.;SOLUTION: The method of manufacturing the thin ferroelectric film containing the volatile element includes a normal-temperature step of forming the precursor 5a of the thin ferroelectric film on a substrate at a normal temperature by the physical vapor phase method in a vacuum process, and a high-temperature step of forming a piezoelectric layer (ferroelectric film) 5 from the precursor 5a by heat-treating the substrate having the formed precursor 5a under an atmospheric pressure containing oxygen or under a pressurized condition.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种制造铁电薄膜的方法,通过该方法,可以在制造包含挥发性元素的薄膜电薄膜时消除由挥发性元素的汽化(抽出)引起的不便。并提供铁电存储器件,铁电元件,喷墨记录头,喷墨打印机,表面声波元件,频率滤波器,振荡器,电子电路和电子设备。;解决方案:薄铁电膜的制造方法包含挥发性元素的方法包括常温步骤,该常温步骤是在真空工艺中通过物理气相法在常温下在基板上形成铁电薄膜的前体5a的步骤;以及高温步骤,其是形成压电层的步骤(在具有氧气的大气压下或在加压条件下对具有形成的前驱体5a的基板进行热处理,从前驱体5a中获得铁电膜5);版权所有(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005166912A

    专利类型

  • 公开/公告日2005-06-23

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20030403069

  • 申请日2003-12-02

  • 分类号H01L41/09;B41J2/045;B41J2/055;B41J2/16;C23C14/08;C23C14/58;H01L27/105;H01L41/18;H01L41/187;H01L41/22;H02N2/00;H03B5/30;H03H3/08;H03H9/25;

  • 国家 JP

  • 入库时间 2022-08-21 22:34:24

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