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METHOD OF MANUFACTURING SUPERCONDUCTING OXIDE THIN FILM DEVICE AND SUPERCONDUCTING OXIDE THIN FILM DEVICE

机译:制造超导电氧化物薄膜装置和超导电氧化物薄膜装置的方法

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing superconducting oxide thin film device by which a superconducting oxide thin film having a good c-axis orientation can be formed even when buffer layers are formed in thick layers.;SOLUTION: A thick CeO2 first buffer layer 2 contains a (111)-facet, and an Sm2O3 second buffer layer 4 caused to deposit on the first buffer layer 2 is grown as crystal grains smaller than CeO2 crystal grains by one figure or more. A thin EBCO film 5 is grown on the fine crystal grains. The superconducting thin film composed of such ideal crystal grains has a very high superconductive critial current density (Jc) as well as a very high superconductive critical temperature (Tce).;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种制造超导氧化物薄膜器件的方法,通过该方法即使在厚层中形成缓冲层也可以形成具有良好c轴取向的超导氧化物薄膜。 Sub> 2 第一缓冲层2包含一个(111)面,Sm 2 O 3 第二缓冲层4沉积在第一缓冲层上层2生长为比CeO 2 晶粒小一位或更多的晶粒。在细晶粒上生长EBCO薄膜5。由这种理想晶粒组成的超导薄膜具有非常高的超导临界电流密度(Jc)和非常高的超导临界温度(Tce)。;版权所有:(C)2005,JPO&NCIPI

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