Method for manufacturing superconducting thin film formed of oxide superconductor having a portion of a reduced thickness, superconducting thin film manufactured thereby, and superconducting device utilizing the superconducting thin film

摘要

For manufacturing a superconducting thin film (4) having at least one reduced thickness portion, ions are implanted in a principal surface (20) of a crystalline substrate (1) so as to form lattice defects on the principal surface (20) of the substrate (1). The principal surface (20) of the substrate (1) is etched by a wet-etching process so that portions of the lattice defects are distinctly etched so as to form projecting portions (30). An oxide superconductor thin film (4) having a planar upper surface is formed on the etched principal surface (20) of the substrate so that portions (43) on the projecting portions (30) of the substrate have a reduced thickness. IMAGE