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Thin Film Formation of Transparent Conductive Oxides by Solution-Based Mist Deposition Method toward Hybrid Device Applications

机译:基于溶液的雾化氧化物对杂交装置应用的透明导电氧化物薄膜形成

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Transparent conductive oxides, gallium-doped zinc oxide (ZnO:Ga) and tin-doped indium oxide (ITO), were fabricated by a solution-based ultrasonic spray-assisted mist deposition technique. The ZnO:Ga films showed a good c-axis orientation perpendicular to the substrate and achieved low resistivity of 2.3 × 10~(-3) Ω cm with high transmittance in wide wavelength region. ITO films have lower resistivity of 1.4 × 10~(-4) Ω cm and high transmittance over the wavelength of 300 nm.
机译:通过基于溶液的超声波喷射助雾沉积技术制造透明导电氧化物,掺杂掺杂的氧化锌(ZnO:Ga)和掺杂氧化铟氧化铟(ITO)。 ZnO:Ga膜显示出垂直于基板的良好的C轴取向,并且在宽波长区域中具有高透射率的2.3×10〜(-3)Ωcm的低电阻率。 ITO薄膜的电阻率降低1.4×10〜(-4)Ωcm,波长为300nm的高透射率。

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