ALIGNMENT EQUIPMENT AND METHOD, CARRYING SYSTEM AND METHOD, OPTICAL LITHOGRAPHY SYSTEM AND METHOD, AND PROCESS FOR FABRICATING DEVICE

摘要

PROBLEM TO BE SOLVED: To control the temperature of a substrate without increasing the size or lowering the throughput of the equipment.;SOLUTION: The alignment equipment for setting a substrate W in a predetermined rotational state comprises a first detection means 21 for detecting the rotational state of the substrate W, a rotary means 18 rotatable about a predetermined point while mounting the substrate W and setting the substrate W in a predetermined rotational state based on the detection results from the first detection means 21, and a first temperature control means for controlling the temperature of the substrate W.;COPYRIGHT: (C)2006,JPO&NCIPI