PATTERN CORRECTION METHOD, PATTERN CORRECTION SYSTEM, PATTERN CORRECTION PROGRAM, METHOD FOR GENERATING MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a pattern correction method for efficiently and easily forming a predetermined pattern with high accuracy.;SOLUTION: The method includes steps of extracting the design data of correction portions 1a, 2a, 2b, 3a, 3b from the design data of a first pattern 1, 2, 3; acquiring the layout information of a second pattern 1, 2, 3, 4, 5 influencing the first pattern 1, 2, 3; determining the correction contents on the correction portions 1a, 2a, 2b, 3a, 3b on the basis of the layout information of the second pattern 1, 2, 3, 4, 5 and generating design data of a third pattern 7, 8, 9, 10, 11 to carry out the correction contents; generating the design data of the third pattern 7, 8, 9, 10, 11 associated with the region, to be collectively processed together with the design data of the correction portions 1a, 2a, 2b, 3a, 3b; and correcting the correction portions 1a, 2a, 2b, 3a, 3b in accordance with the correction contents.;COPYRIGHT: (C)2006,JPO&NCIPI