首页> 外国专利> METHOD OF PRODUCING COBALT-DOPED TITANIUM DIOXIDE FILM, COBALT-DOPED TITANIUM DIOXIDE FILM, AND MULTILAYER STRUCTURE

METHOD OF PRODUCING COBALT-DOPED TITANIUM DIOXIDE FILM, COBALT-DOPED TITANIUM DIOXIDE FILM, AND MULTILAYER STRUCTURE

机译:制备掺杂钴的二氧化钛膜,掺杂钴的二氧化钛膜和多层结构的方法

摘要

PPROBLEM TO BE SOLVED: To provide a cobalt-doped titanium dioxide film which has a flat surface in an atomic level and has excellent crystallinity, and whose ferromagnetic properties can be controlled freely. PSOLUTION: A titanium dioxide film 12 is formed on a substrate 11. Next, a titanium dioxide film 13 doped with cobalt is formed on the titanium dioxide film 12. PCOPYRIGHT: (C)2005,JPO&NCIPI
机译:

要解决的问题:提供一种钴掺杂的二氧化钛膜,该膜具有原子级的平坦表面并具有优异的结晶度,并且其铁磁性能可以自由控制。

解决方案:在基板11上形成二氧化钛膜12。接着,在二氧化钛膜12上形成掺杂有钴的二氧化钛膜13。

版权:(C)2005,JPO&NCIPI

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