首页> 外国专利> IN-SITU HYDROTHERMAL-ELECTROCHEMICAL PROCESS FOR OBTAINING THIN NANO-STRUCTURED FILMS OF COBALT-DOPED TITANIUM DIOXIDE

IN-SITU HYDROTHERMAL-ELECTROCHEMICAL PROCESS FOR OBTAINING THIN NANO-STRUCTURED FILMS OF COBALT-DOPED TITANIUM DIOXIDE

机译:钴掺杂二氧化钛薄纳米结构膜的原位热电过程

摘要

The invention relates to a process for obtaining thin nano-structured films of cobalt-doped titanium dioxide. According to the invention, the process is based on the in-situ hydrothermal-electrochemical deposition of the thin nano-structured films of titanium dioxide doped with 0.5...10% cobalt, having a homogenous distribution of the dopant on the deposition surface, performed in one stage, at temperatures of 150...200°C, for 1...10 min.
机译:本发明涉及获得钴掺杂的二氧化钛的纳米结构薄膜的方法。根据本发明,该方法基于原位水热电化学沉积掺杂有0.5 ... 10%钴的二氧化钛纳米结构薄膜,在沉积表面上掺杂剂的分布均匀,在150 ... 200°C的温度下分阶段进行1 ... 10分钟。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号