首页> 外国专利> APPARATUS AND METHOD FOR MEASURING AMOUNT OF PHASE SHIFT AND METHOD OF MANUFACTURING PHASE SHIFT MASK

APPARATUS AND METHOD FOR MEASURING AMOUNT OF PHASE SHIFT AND METHOD OF MANUFACTURING PHASE SHIFT MASK

机译:测量移相量的装置和方法以及制造移相面罩的方法

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and a method for measuring the amount of phase shift allowing precise measurement of the amount of phase shift.;SOLUTION: The apparatus for measuring the amount of phase shift comprises a light source 11, a grating 15 which generates diffracted light, a lens 13b which superposes diffracted light 40a, 40b and allows them to enter a PSM 16, a beam splitter 25a which splits light passed through the PSM 16 into a first beam 41a and a second beam 42b, an optical wedge 28 which provides the two beams with a phase difference, an optical shearing member 26 which displaces the two beams laterally, a beam splitter 25b which generates interfered light by superposing the two beams, and a detector 30 which detects the interfered light 42. The detector 30 detects the light intensity of the interfered light at two detection points simultaneously, and measures the amount of phase shift ϕ of a phase shifter based on the phase difference of the light intensity.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种用于测量相移量的装置和方法,以允许精确测量相移量。解决方案:用于测量相移量的装置包括光源11,光栅15产生衍射光的透镜,与衍射光40a,40b重叠并允许它们进入PSM 16的透镜13b,将通过PSM 16的光分成第一光束41a和第二光束42b的分束器25a,光学楔块提供两个具有相位差的光束的28,一个光剪切部件26使两个光束横向移动,一个分束器25b,它通过重叠两个光束产生干涉光,以及一个检测器30,它检测干涉光42。在图30中,在两个检测点同时检测被干扰光的光强度,并测量相移量φ。基于光强度的相位差的移相器的设计。;版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005083974A

    专利类型

  • 公开/公告日2005-03-31

    原文格式PDF

  • 申请/专利权人 LASERTEC CORP;

    申请/专利号JP20030318278

  • 发明设计人 MIYAZAKI KOJI;KUSUSE HARUHIKO;

    申请日2003-09-10

  • 分类号G01J9/02;G01M11/00;G03F1/08;

  • 国家 JP

  • 入库时间 2022-08-21 22:30:38

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