MASK FOR EXPOSURE, OPTICAL PROXIMITY EFFECT CORRECTION APPARATUS, OPTICAL PROXIMITY EFFECT CORRECTION METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND OPTICAL PROXIMITY EFFECT CORRECTION PROGRAM

摘要

PROBLEM TO BE SOLVED: To enhance efficiency of an optical proximity effect correction while suppressing deterioration in the accuracy of the optical proximity effect correction.;SOLUTION: An inspection region R1 is determined with respect to a mask pattern MP1. When the pattern density of the inspection region R1 is less than a specified value, an objective pattern P1 in the inspection region R1 is subjected to optical proximity effect correction in a specified correction amount.;COPYRIGHT: (C)2005,JPO&NCIPI