HIGH PURITY VANADIUM, TARGET COMPOSED OF VANADIUM, THIN FILM OF VANADIUM, METHOD OF PRODUCING VANADIUM, AND METHOD OF PRODUCING SPUTTERING TARGET OF VANADIUM

摘要

PROBLEM TO BE SOLVED: To produce high purity vanadium in which the isotopes of U, Th or the like radiating alpha particles and exerting adverse effects on a micro-circuit in a semiconductor device are strictly reduced, to provide a target composed of the high purity vanadium, to provide a high purity vanadium thin film, to provide a method of producing the high purity vanadium for strictly reducing the isotopes of U, Th or the like and to provide a method of producing the vanadium sputtering target.;SOLUTION: In the high purity vanadium, the contents of impurities such as the isotopes of U and the isotopes of Th producing radiation are made to be1 wtppb, respectively. The target and thin film are composed of the vanadium.;COPYRIGHT: (C)2005,JPO&NCIPI