首页> 外国专利> Method of Anti-weed, etc. of the structure and the structure of the structure and the Anti-weed was intended of the intended structure the Anti-weed, etc.

Method of Anti-weed, etc. of the structure and the structure of the structure and the Anti-weed was intended of the intended structure the Anti-weed, etc.

机译:结构的防杂草的方法以及该结构和防杂草的结构旨在防杂草等的预期结构

摘要

PPROBLEM TO BE SOLVED: To prevent weeds from propagating with their buds growing upward (apogeotropism) through a gap by phototropism and their roots growing downward (positive geotropism) by geotropism, as the weeds have a nature of growing on photosynthesis when their seeds come flying into the gap and germinate due to a flow of rainwater, when gap is generated vertically at a boundary line of a boundary block and a paving material due to aged deterioration. PSOLUTION: A construction 1 to be joined is provided with a weed-preventing recess 2 opening toward its wall surface. An upper side inner surface 2a of the recess 2 is formed to tilt upwardly toward the inner part of the recess 2. The other construction 4 to be joined is formed in a manner that a material of the other construction 4 is placed to fill up the recess 2 so that a surface 4a may be positioned near or above an upper end 2c of an opening part 2b of the recess 2. PCOPYRIGHT: (C)2004,JPO
机译:

要解决的问题:由于杂草具有光合作用的生长特性,因此可以防止杂草随着光合作用通过间隙向上生长(促胚性)并通过根向性向下方生长(正向性亲合性),从而防止杂草繁殖当由于老化而在边界块和铺路材料的边界线上垂直产生间隙时,种子因雨水的流动而飞入间隙并发芽。

解决方案:待连接的结构1设有朝向其壁表面开口的防杂草凹槽2。凹部2的上侧内表面2a形成为朝向凹部2的内部向上倾斜。要接合的另一结构4以放置另一结构4的材料以填充该结构的方式形成。凹部2,使得表面4a可以位于凹部2的开口部2b的上端2c附近或上方。

版权:(C)2004,JPO

著录项

  • 公开/公告号JP3698265B2

    专利类型

  • 公开/公告日2005-09-21

    原文格式PDF

  • 申请/专利权人 石川 繁;

    申请/专利号JP20030361894

  • 发明设计人 石川 繁;

    申请日2003-10-22

  • 分类号E01C11/22;E01H11/00;E02B5/02;

  • 国家 JP

  • 入库时间 2022-08-21 22:28:44

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