The super thin film and thin film measurement mannered

摘要

PROBLEM TO BE SOLVED: To provide a measuring method using a spectral ellipsometer by a minimal value calculation method (BLMC), for determining precisely and accurately wavelength dependency of an ultrathin film, a thin film structure and a permittivity.;SOLUTION: This measuring method using the spectral ellipsometer by the minimal value calculation method (BLMC) includes following steps. Concerning the thin film on the substrate surface which is a measuring object, measuring spectrums ΨE (λ_i) and ΔE (λ_i) which are the change of polarization of incident light and reflected light relative to each wavelength λ_i are acquired by changing the wavelength of incident light. (N₀, (n₀, k₀)) of the substrate and (d, N(n, k)) of the thin film on the substrate are assumed by using a dispersion formula, and plural film thicknesses (d±mΔd) in the anticipated range and plural incident angles (ϕ±mΔϕ) in the anticipated range are set, and each ΨM, ΔM are acquired therefrom. The ΨE, ΔE spectrums are compared with each ΨM, ΔM modeling spectrum, and fitting is performed by using the minimal value calculation method (BLMC), and a structure reaching a standard is determined as a measuring result.;COPYRIGHT: (C)2003,JPO