The super thin film and thin film measurement mannered

摘要

PROBLEM TO BE SOLVED: To provide a measuring method which uses a spectral ellipsometer based on minimal value calculation method (BLMC), for precisely and accurately determining the wavelength dependence of an ultra-thin film, a thin-film structure and the dielectric.;SOLUTION: This measuring method which uses spectral ellipsometer by the minimal value calculation method (BLMC) includes following steps. Concerning the thin film on the substrate surface which is an object of measurement, measurement spectrums Ψ_E(λ_i) and Δ_E(λ_i), which are the change of polarization of incident light and reflected light relative to each wavelength λ_i are acquired, by changing the wavelength of incident light. (N₀, (n₀, k₀)) of the substrate and (d, N(n, k)) of the thin film on the substrate are assumed based on dispersion formula, and plural film thicknesses (d±mΔd) in the anticipated range and plural incident angles (ϕ±mΔϕ) in the anticipated range are set, and each Ψ_M, Δ_M are acquired therefrom. The Ψ_E, Δ_E spectras are compared with the Ψ_M, Δ_M modeling spectrum, and fitting is carried out by using the minimal value calculation method (BLMC), and a structure which has reached the standard is decided as the measured result.;COPYRIGHT: (C)2004,JPO&NCIPI