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Charged particle beam apparatus

机译:带电粒子束装置

摘要

When conditions for an electron gun mainly represented by extraction voltage V1 and accelerating voltage V0 are changed, a charged particle beam is once focused on a fixed position by means of a condenser lens and a virtual cathode position is calculated from a lens excitation of the condenser lens at that time and the mechanical positional relation of the electron gun to set an optical condition. For more accurate setting of the optical condition, a deflecting electrode device is provided at a crossover position of the condenser lens and a voltage is applied to the deflecting electrode device at a constant period so as to control the lens excitation of the condenser lens such that the amount of movement of an image is minimized on an image display unit such as CRT.
机译:当主要由提取电压V1和加速电压V0表示的电子枪的条件发生变化时,带电粒子束通过聚光镜一次聚焦在固定位置上,并根据聚光镜的透镜激励计算出虚拟阴极位置当时的镜头和电子枪的机械位置关系来设定光学条件。为了更准确地设置光学条件,在聚光透镜的交叉位置处设置偏转电极装置,并且以恒定的周期向偏转电极装置施加电压,以控制聚光透镜的透镜激励,使得在诸如CRT的图像显示单元上,图像的移动量​​被最小化。

著录项

  • 公开/公告号US2004222376A1

    专利类型

  • 公开/公告日2004-11-11

    原文格式PDF

  • 申请/专利权人 HITACHI HIGH-TECHNOLOGIES CORPORATION;

    申请/专利号US20040838342

  • 发明设计人 MITSUGU SATO;YUKO SASAKI;

    申请日2004-05-05

  • 分类号H01J1/62;G01N23/00;

  • 国家 US

  • 入库时间 2022-08-21 22:25:52

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