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Method and device for adjusting an alignment microscope by means of a reflective alignment mask

机译:通过反射式对准掩模调整对准显微镜的方法和装置

摘要

The present invention provides for a method for adjusting an alignment microscope. In the method of the present invention an alignment mask is used in which the one side comprises at least one alignment mark and the other side is reflective. For the adjustment, the microscope is first focused to the alignment mark and then refocused to the mirror image of the alignment mark generated by the reflective side. The microscope is then adjusted by comparing the positions of the alignment mark and the generated mirror image of the alignment mark until the alignment mark overlaps its mirror image. Moreover, a device for adjusting an alignment microscope in accordance with the method of the present invention.
机译:本发明提供一种用于调整对准显微镜的方法。在本发明的方法中,使用对准掩模,其中一侧包括至少一个对准标记,而另一侧是反射性的。为了进行调整,首先将显微镜聚焦到对准标记,然后再聚焦到反射侧生成的对准标记的镜像。然后通过比较对准标记的位置和对准标记的生成的镜像直到对准标记与其镜像重叠,来调整显微镜。此外,根据本发明的方法的用于调整对准显微镜的设备。

著录项

  • 公开/公告号US2004257552A1

    专利类型

  • 公开/公告日2004-12-23

    原文格式PDF

  • 申请/专利权人 HANSEN SVEN;

    申请/专利号US20040767124

  • 发明设计人 SVEN HANSEN;

    申请日2004-01-29

  • 分类号G03B27/52;

  • 国家 US

  • 入库时间 2022-08-21 22:22:55

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