One dimensional nanostructures for vertical heterointegration on a silicon platform and method for making same

摘要

Methods and devices are provided in which vertically integrated devices are grown in the form of semiconductor (e.g., Ge, GaAs, InGaAs, etc.) one-dimensional nanowires with typical diameter of from about 5 nm to about 50 nm and aspect ratio of about 1:10. In one embodiment a nanometer-scale diameter pillar extending from a silicon substrate is employed as a “seed” for fabricating vertical, one-dimensional hetero-structures (and/or hetero-devices) containing semiconductor materials with lattice and thermal expansion mismatches to silicon.