首页> 外国专利> Semiconductor device made from silicon carbide with a Schottky contact and an ohmic contact made from a nickel-aluminum material

Semiconductor device made from silicon carbide with a Schottky contact and an ohmic contact made from a nickel-aluminum material

机译:由具有肖特基触点和由镍铝材料制成的欧姆触点的碳化硅制成的半导体器件

摘要

The semiconductor device includes a first semiconductor region made from n-conducting SiC and a second semiconductor region made from p-conducting SiC. A Schottky contact layer electrically contacts the first semiconductor region, and an ohmic p-contact layer electrically contacts the second semiconductor region. Both contact layers consist of a nickel-aluminum material. This allows both contact layers to be annealed together without adversely effecting the Schottky contact behavior.
机译:该半导体器件包括由n导电的SiC制成的第一半导体区域和由p导电的SiC制成的第二半导体区域。肖特基接触层电接触第一半导体区域,并且欧姆p接触层电接触第二半导体区域。两个接触层均由镍铝材料组成。这允许两个接触层一起退火,而不会不利地影响肖特基接触行为。

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