首页>
外国专利>
Process depending on plasma discharges sustained by inductive coupling
Process depending on plasma discharges sustained by inductive coupling
展开▼
机译:该过程取决于感应耦合维持的等离子体放电
展开▼
页面导航
摘要
著录项
相似文献
摘要
A process for fabricating a product 28, 119. The process comprises the steps of subjecting a substrate to a composition of entities, at least one of the entities emanating from a species generated by a gaseous discharge excited by a high frequency field in which the vector sum of currents to phase and inverse-phase capacitive coupled voltages from the inductive coupling structure can be selectively maintained.
展开▼