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Semiconductor laser device capable of suppressing leakage current in a light emitting end surface and method for manufacturing same

机译:能够抑制发光端面中的漏电流的半导体激光装置及其制造方法

摘要

For evaporating a protective coating on a light emitting end surface 51a of a laser chip 51, there is formed first an Si film 52a, which is free from generation of oxygen due to decomposition. Thus, there is created a coating in the vicinity of the light emitting end surface 51a immediately after start of evaporation process under conditions of low partial pressure of oxygen. At the same time, in the later evaporation process of the protective coating 52b, if oxygen is generated due to decomposition of the evaporation material Al2O3, and oxygen partial pressure is increased, collision or bonding of the oxygen with the end surface 51a is prevented, thereby decreasing damages given to the end surface 51a in the process of protective coating creation. Further, the Si film 52a has a film thickness as small as approx. 20 Å. This controls generation of leakage current in the Si film 52a (or the end surface 51a), and prevents negative influence on oscillation characteristics.
机译:为了使激光芯片 51 的发光端面 51 a 上的保护涂层蒸发,首先形成Si膜。 52 a ,由于分解没有氧的产生。因此,在氧气分压低的条件下,在蒸发过程开始之后立即在发光端面 51 a 附近产生涂层。同时,在随后的保护膜 52 b 的蒸发过程中,如果由于蒸发材料Al 2 O 3 ,并且增加了氧分压,防止了氧与端面 51 a 的碰撞或键合,从而减少了损坏在保护涂层形成过程中赋予端面 51 a 。此外,Si膜 52 a 具有的膜厚度小至约1μm。 20岁。这样可以控制在硅膜 52 a (或端面 51 a )中产生泄漏电流,并且防止对振荡特性产生负面影响。

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