首页> 外国专利> Step-shaped floating poly-si gate to improve a gate coupling ratio for flash memory application

Step-shaped floating poly-si gate to improve a gate coupling ratio for flash memory application

机译:阶梯形浮动多晶硅栅极,提高了闪存应用的栅极耦合率

摘要

A stacked-gate flash memory cell is provided having step-shaped poly-gates with increased overlap area between them in order to increase the coupling ratio and hence the program speed of the cell. The floating gate is first formed with a step and the intergate dielectric is conformally shaped thereon followed by the forming of the control gate thereon. The increase in the-overlap area can be achieved by forming gates with multiply connected surfaces of different shapes.
机译:所提供的堆叠栅闪存单元具有阶梯状的多晶硅栅,在它们之间具有增加的重叠面积,以便提高耦合率,从而提高单元的编程速度。浮栅首先形成有台阶,并且栅间电介质在其上保形地成形,然后在其上形成控制栅。重叠面积的增加可以通过形成具有多个不同形状的连接表面的栅极来实现。

著录项

  • 公开/公告号US6838725B2

    专利类型

  • 公开/公告日2005-01-04

    原文格式PDF

  • 申请/专利权人 CHRONG-JUNG LIN;SHUI-HUNG CHEN;

    申请/专利号US20000726663

  • 发明设计人 CHRONG-JUNG LIN;SHUI-HUNG CHEN;

    申请日2000-11-30

  • 分类号H01L2906;H01L29788;H01L29788;

  • 国家 US

  • 入库时间 2022-08-21 22:19:01

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