首页> 外国专利> METHOD OF MAKING M002 POWDERS, PRODUCTS MADE FROM M002 POWDERS, DEPOSITION OF M002 THIN FILMS, AND METHODS OF USING SUCH MATERIALS

METHOD OF MAKING M002 POWDERS, PRODUCTS MADE FROM M002 POWDERS, DEPOSITION OF M002 THIN FILMS, AND METHODS OF USING SUCH MATERIALS

机译:M002粉末的制造方法,M002粉末制成的产品,M002薄膜的沉积以及使用此类材料的方法

摘要

The invention relates to high purity MoO2 powder by reduction of ammoniummolybdate or molybdenum trioxide using hydrogen as the reducing agent in arotary or boat furnace. Consolidation of the powder by press/sintering, hotpressing, and/or HIP is used to make discs, slabs, or plates, which are usedas sputtering targets. The MoO2 disc, slab, or plate form is sputtered on asubstrate using a suitable sputtering method or other physical means toprovide a thin film having a desired film thickness. The thin films haveproperties such as electrical, optical, surface roughness, and uniformitycomparable or superior to those of indium-tin oxide (ITO) and zinc-doped ITOin terms of transparency, conductivity, work function, uniformity, and surfaceroughness. The MoO2 and MoO2 containing thin films can be used in organiclight-emitting diodes (OLED), liquid crystal display (LCD), plasma displaypanel (PDP), field emission display (FED), thin film solar cell, lowresistivity ohmic contacts, and other electronic and semiconductor devices.
机译:本发明涉及一种还原铵的高纯MoO2粉钼酸盐或三氧化钼在氢气中用作还原剂旋转炉或船用炉。通过热压/烧结固结粉末压制和/或HIP用于制作圆盘,平板或平板作为溅射靶。将MoO2圆盘,平板或平板形式溅射到使用合适的溅射方法或其他物理手段处理基板提供具有所需膜厚度的薄膜。薄膜有特性,例如电,光学,表面粗糙度和均匀性与氧化铟锡(ITO)和掺杂锌的ITO相当或优于在透明度,导电性,功函数,均匀性和表面方面粗糙度。含MoO2和MoO2的薄膜可用于有机发光二极管(OLED),液晶显示器(LCD),等离子显示器面板(PDP),场发射显示器(FED),薄膜太阳能电池,低电阻欧姆接触以及其他电子和半导体设备。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号