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Memory device utilizing carbon nanotubes and method of fabricating the memory device

机译:利用碳纳米管的存储器件及其制造方法

摘要

A carbon nanotube memory device and a fabrication method thereof are provided. The carbon nanotube memory device includes a substrate (11), a source electrode (15), a drain electrode (17), a carbon nanotube (21), a memory cell (23), and a gate electrode (19). The source electrode (15) and the drain electrode (17) are arranged with a predetermined interval between them on the substrate (11) and subjected to a voltage. The carbon nanotube (21) connects the source electrode (15) to the drain electrode (17) and serves as a channel for charges. The memory cell (23) is located over the carbon nanotube (21) and stores charges from the carbon nanotube (21). The gate electrode (19) is formed in contact with the upper surface of the memory cell (23) and controls the amount of charge flowing from the carbon nanotube (21) into the memory cell (23). As described above, the carbon nanotube memory device includes the carbon nanotube (21) having a high conductivity and a high emissivity, and the memory cell (23) having an excellent charge storage capability, so that the memory device can function as a fast, highly-integrated memory device without errors.
机译:提供了一种碳纳米管存储器件及其制造方法。碳纳米管存储器件包括基板(11),源电极(15),漏电极(17),碳纳米管(21),存储单元(23)和栅电极(19)。源电极(15)和漏电极(17)以预定的间隔布置在基板(11)上并施加电压。碳纳米管(21)将源电极(15)连接至漏电极(17),并用作电荷的通道。存储器单元(23)位于碳纳米管(21)上方并存储来自碳纳米管(21)的电荷。栅电极(19)形成为与存储单元(23)的上表面接触,并控制从碳纳米管(21)流入存储单元(23)的电荷量。如上所述,碳纳米管存储器件包括具有高导电性和高发射率的碳纳米管(21)以及具有优异的电荷存储能力的存储单元(23),从而该存储器件可以用作快速,高度集成的存储设备,无错误。

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