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Memory device utilizing carbon nanotubes and method of fabricating the memory device

机译:利用碳纳米管的存储器件及其制造方法

摘要

A fast, reliable, highly integrated memory device formed of a carbon nanotube memory device and a method for forming the same, in which the carbon nanotube memory device includes a substrate, a source electrode, a drain electrode, a carbon nanotube having high electrical and thermal conductivity, a memory cell having excellent charge storage capability, and a gate electrode. The source electrode and drain electrode are arranged with a predetermined interval between them on the substrate and are subjected to a voltage. The carbon nanotube connects the source electrode to the drain electrode and serves as a channel for charge movement. The memory cell is located over the carbon nanotube and stores charges from the carbon nanotube. The gate electrode is formed in contact with the upper surface of the memory cell and controls the amount of charge flowing from the carbon nanotube into the memory cell.
机译:由碳纳米管存储器件形成的快速,可靠,高度集成的存储器件及其形成方法,其中,碳纳米管存储器件包括基板,源电极,漏电极,具有高电导率的碳纳米管。导热性,具有优异电荷存储能力的存储单元以及栅电极。源电极和漏电极以在它们之间的预定间隔布置在基板上并且经受电压。碳纳米管将源电极连接到漏电极,并用作电荷移动的通道。存储器单元位于碳纳米管上方并存储来自碳纳米管的电荷。栅电极形成为与存储单元的上表面接触并且控制从碳纳米管流入存储单元的电荷量。

著录项

  • 公开/公告号US2003170930A1

    专利类型

  • 公开/公告日2003-09-11

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号US20030361024

  • 发明设计人 WON-BONG CHOI;JAE-UK CHU;IN-KYEONG YOO;

    申请日2003-02-10

  • 分类号H01L35/24;H01L51/00;H01L51/40;H01L29/76;H01L29/94;H01L31/062;H01L31/119;H01L31/113;

  • 国家 US

  • 入库时间 2022-08-22 00:12:00

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