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TITANIA COATINGS BY PLASMA CVD AT ATMOSPHERIC PRESSURE
TITANIA COATINGS BY PLASMA CVD AT ATMOSPHERIC PRESSURE
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机译:等离子化学气相沉积钛涂层
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摘要
A method for deposition of titania, and titania-containing, thin films by CVD, using an atmospheric pressure glow discharge plasma as a major source of reaction, which leads to film properties, and film growth rates, normally only achievable (by atmospheric pressure CVD) with significantly higher substrate temperatures.
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