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TITANIA COATINGS BY PLASMA CVD AT ATMOSPHERIC PRESSURE
TITANIA COATINGS BY PLASMA CVD AT ATMOSPHERIC PRESSURE
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机译:等离子化学气相沉积钛涂层
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摘要
A method is described for deposition of titania and titania-containing thin films by CVD, using an atmospheric pressure glow discharge plasma at substrate temperatures below 250°C.
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